Diamond CVD Coating on Si

Diamond CVD Coating on Si - Wafer

Product Properties:

DIAMOND LAYER

DESCRIPTION: Diamond CVD On Silicon Wafer
GROWTH METHOD: MPCVD
THICKNESS: 15±5µm
GROWING ZONE: 50.8±0.2mm
SURFACE ROUGHNESS: 0.7 µm
GRAIN SIZE: ≤20 µm
FWHM (D111): 0.355 nm
THERMAL CONDUCTIVITY: 1800-2000W/m.K
WARPAGE: <30 µm
TTV: <10 µm
CTE: 1.3

SI WAFER

MODEL DOPING AGENT: P/B
PULLING METHOD: CZ
CRYSTAL ORIENTATION: 100
RESITIVITY RANGE: 20-30 ohm-cm
DIAMETER: 50.8±0.2mm
DEVIATION DEGREE OF CRYSTAL ORIENTAION:<1°
THICKENSS AND TOLERANCE: 30000±20 µm
TTV: ≤10 µm
WARPAGE: ≤10 µm
SURFACE FINISH: Single sided polishing

Applications

DIASI	MPCVD DIAMOND COATED SILICON WAFERS

PRODUCT CODE	DIASEMI DIAMOND #	WAFER SIZE(mm)	WAFER TYPE	DIASEMI CAOTING THICKNESS(µm）	PRICE USD
DISI100-01	DIASEMI-N1	100		1	$
DISI100-02	DIASEMI-N1	100		2	$
DISI100-05	DIASEMI-N1	100		5	$
DISI100-10	DIASEMI-N1	100		10	$
DISI100-15	DIASEMI-N1	100		15	$
DISI150-01	DIASEMI-N1	150		1	$
DISI150-02	DIASEMI-N1	150		2	$
DISI150-05	DIASEMI-N1	150		5	$
DISI150-10	DIASEMI-N1	150		10	$
DISI150-15	DIASEMI-N1	150		15	$
DISI200-01	DIASEMI-N1	200		1	$
DISI200-02	DIASEMI-N1	200		2	$
DISI200-05	DIASEMI-N1	200		5	$
DISI200-10	DIASEMI-N1	200		10	$
DISI200-15	DIASEMI-N1	200		15	$

Diamond CVD Coating on Si - Wafer